Evidence map›Paper›PMID 41074252›Full record

ArticleSmall methods2025

Low-Cost Maskless Photolithography Using an LCD-3D Printer for Microelectronic Devices.

Qianqian Wu, Ying Zhang, Thomas Pucher, Bob McLarnon, Esteban Zamora Amo, Peng Zhang, Yong Xie, Andres Castellanos-Gomez

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Small methods, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Qianqian WuEngineering Research Center of IoT Technology Applications (Ministry of Education), School of Integrated Circuits, Jiangnan University, Wuxi, 214122, China.
Ying Zhang2D Foundry research group. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Madrid, 28049, Spain.
Thomas Pucher2D Foundry research group. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Madrid, 28049, Spain.ORCID https://orcid.org/0009-0005-2100-8241
Bob McLarnon2D Foundry research group. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Madrid, 28049, Spain.
Esteban Zamora Amo2D Foundry research group. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Madrid, 28049, Spain.ORCID https://orcid.org/0009-0001-7682-9187
Peng ZhangKey Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University, Xi'an, 710071, China.ORCID https://orcid.org/0000-0002-8065-0948
Yong Xie2D Foundry research group. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Madrid, 28049, Spain.ORCID https://orcid.org/0000-0001-7904-664X
Andres Castellanos-Gomez2D Foundry research group. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Madrid, 28049, Spain.ORCID https://orcid.org/0000-0002-3384-3405

Funding

China Scholarship Council 202408360065China Sponsorship Council 202406790090HORIZON EUROPE European Research Council 101167218HORIZON EUROPE European Research Council 101185235Ministerio de Ciencia, Innovación y Universidades PDC2023-145920-I00Ministerio de Ciencia, Innovación y Universidades PID2023-151946OB-I00
6 · The paper itself

Abstract

A cost-effective and flexible approach is presented to maskless photolithography using a commercial Liquid Crystal Display (LCD)-based Masked Stereolithography Apparatus (MSLA) 3D printer. This method enables rapid and flexible patterning of photoresist-coated silicon wafers without the need for traditional photomasks, as well as the fabrication of large-area wafer-scale electrode arrays, offering a highly accessible alternative for microdevice fabrication. The process achieves spatial resolution approaching 20 µm and is demonstrated in the fabrication of gold electrodes for two-dimensional (2D) material-based transistors. The electrodes are used to integrate MoS

Indexed as

2D materialhigh‐precisionLCD‐MSLA 3D printerlow‐costmaskless photolithographywafer‐scale

Identifiers

PMID41074252
PMCPMC12641379

What OpenQuestion holds

Textmetadata
LicenceCC BY-NC
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.