ArticleNature communications2025
Tellurium-assisted growth of large-scale atom-thin insulating amorphous carbon on insulating substrates.
Article in Nature communications, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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Abstract
Monolayer amorphous carbon (a-C), an atom-thin two-dimensional (2D) carbon amorphous material, has attracted significant attention due to its structural and transport properties. Here, we report a chemical vapor deposition (CVD) approach for directly synthesizing monolayer a-C films on insulating substrates, achieving high control over their size, thickness, and fabrication. The synthesized films exhibit a complete coverage over a 2-inch wafer, with high uniformity. Our theoretical analysis reveals the critical role of tellurium in promoting the growth of monolayer a-C on the substrate. Moreover, quantum tunneling measurements at liquid helium temperature were conducted on the a-C films, confirming the samples' homogeneity and their insulating behavior. This work provides a promising strategy for direct synthesis of atom-thin insulating amorphous materials and deepens our understanding of quantum phenomena and electronic properties in low-dimensional disordered materials.
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