Evidence map›Paper›PMID 41012199›Full record

ArticlePolymers2025

An Acid-Cleavable Lamellar Block Copolymer for Sub-30-nm Line Spacing Patterning via Graphoepitaxial Directed Self-Assembly and Direct Wet Etching.

Jianghao Zhan, Caiwei Shang, Muqiao Niu, Jiacheng Luo, Shengguang Gao, Zhiyong Wu, Shengru Niu, Yiming Xu, Xingmiao Zhang, Zili Li and 1 more

Abstract read
In one paragraph

Article in Polymers, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.

0numbers the graph read from it
0cells of the map it votes in
2citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

2 citing papers in PubMed.

  1. Article
  2. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

11 authors.

Jianghao ZhanCenter of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China.ORCID 0000-0002-5416-492X
Caiwei ShangCenter of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China.ORCID 0009-0006-0676-3019
Muqiao NiuCenter of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China.
Jiacheng LuoCenter of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China.
Shengguang GaoZhangjiang Laboratory, 100 Haike Road, Shanghai 201204, China.
Zhiyong WuZhangjiang Laboratory, 100 Haike Road, Shanghai 201204, China.
Shengru NiuCenter of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China.
Yiming XuCenter of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China.
Xingmiao ZhangZhangjiang Laboratory, 100 Haike Road, Shanghai 201204, China.
Zili LiCenter of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China.ORCID 0000-0001-9921-6394
Shisheng XiongCenter of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Graphoepitaxial directed self-assembly (DSA) of block copolymers (BCPs) has emerged as a promising strategy for sub-30 nm line spacing patterning in semiconductor nanofabrication. Among the available BCP systems, polystyrene-block-poly (methyl methacrylate) (PS-

Indexed as

acid-cleavable block copolymergraphoepitaxial directed self-assemblyline/space patternwet etching

Identifiers

PMID41012199
PMCPMC12473877

What OpenQuestion holds

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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.