ArticleNature communications2025
Spatial control of curing kinetics in thiol-ene-systems through antagonistic photoreactions.
Article in Nature communications, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.
What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
1 citing paper in PubMed.
- Dual-wavelength photopatterning unlocks spatially programmable heterogeneity in liquid crystal elastomers.Nature communications · 2026Article
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
9 authors.
Funding
Abstract
The use of two wavelengths to activate different photoreactions in a resin system has recently attracted much attention in the scientific community. Here, wavelength orthogonal photochemistry was used to spatially control the curing kinetics of the thiol-ene photopolymerization reaction. Antagonistic photochemical control is successfully applied to thiol-ene polymerization. In the investigated resin (pentaerythritol-tetrakis(3-mercaptopropionat); PETMP and triallyl-triazine-2,4,6(1H,3H,5H)-trione; TATO) system, radical curing is activated by a type II photoinitiator at 450 nm, while light at 365 nm is used to photorelease a base, resulting in an inhibition of the curing reaction. The antagonistic nature of these photoreactions is demonstrated in laser writing with minimum feature sizes below 0.5 µm as well as in grey scale patterning experiments. Spatially controlled inhibition and retardation of the thiol-ene curing reaction on a sub-micron scale have potential applications in advanced large area lithography, e.g. interference lithography.
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Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.