Effect of Chromium Adhesion Layer Thickness on Contact Resistance and Schottky Barrier Characteristics in WSe

Sung-Ha Kim, Seong-Yeon Lee, Tae-Jeong Kim, Kwangseuk Kyhm, Kenji Watanabe, Takashi Taniguchi, Ki-Ju Yee

Abstract read

In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it

0cells of the map it votes in

1citing papers in PubMed

–field-weighted citation impact

1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

Solution-Shearing Self-Assembly of Hydrothermally Synthesized Tellurium Nanowires for Fabricating Field-Effect Transistors with Wafer-Scale Uniformity.Nanomaterials (Basel, Switzerland) · 2026
Article

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

7 authors.

Sung-Ha KimDepartment of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.

Seong-Yeon LeeInstitut Néel, University Grenoble Alpes, 38000 Grenoble, France.

Tae-Jeong KimDepartment of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.

Kwangseuk KyhmDepartment of Opto & Cogno Mechatronics Engineering, RCDAMP, Pusan National University, Busan 46241, Republic of Korea.ORCID 0000-0003-3646-3560

Kenji WatanabeResearch Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan.ORCID 0000-0003-3701-8119

Takashi TaniguchiResearch Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan.

Ki-Ju YeeDepartment of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.

Funding

Ministry of Science and ICT RS-2023-00236798National Research Foundation of Korea NRF-2020R1A6A1A03047771National Research Foundation of Korea NRF-2023R1A2C1004284

6 · The paper itself

Abstract

While metal adhesion layers are commonly used in the fabrication of field-effect transistors (FETs) based on two-dimensional (2D) materials, the impact of adhesion layer thickness on device performance remains insufficiently explored. In this study, we systematically investigate how the thickness of a Cr adhesion layer influences the contact resistance and Schottky barrier characteristics of multilayer WSe

Indexed as

contact resistanceimage force loweringSchottky barrier heighttransfer length methodWSe2 field–effect transistors

Identifiers

PMID41003049

DOI10.3390/nano15181413

PMCPMC12472889

What OpenQuestion holds

Textmetadata

LicenceCC BY

Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.