Evidence map›Paper›PMID 40994289›Full record

ArticleACS nano2025

Dual-Step Chemical Treatment of Wafer-Scale Metal-Organic Chemical Vapor Deposition Grown Monolayer Molybdenum Disulfides.

Juhwan Lim, Anh Tuấn Hoàng, Zhaojun Li, Tran Thi Ngoc Van, Jung-In Lee, Kihyun Lee, Nicolas Gauriot, Kyle Frohna, Takashi Taniguchi, Kenji Watanabe and 6 more

Abstract read
In one paragraph

Article in ACS nano, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Nonuniform Chemical Passivation Dynamics in Monolayer MoSThe journal of physical chemistry letters · 2026
    Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

16 authors.

Juhwan LimCavendish Laboratory, University of Cambridge, Cambridge, CB3 OHE, U.K.ORCID 0000-0003-2597-3012
Anh Tuấn HoàngSchool of Electrical and Electronic Engineering, Yonsei University, Seoul, 03722, Republic of Korea.ORCID 0000-0003-0911-1391
Zhaojun LiCavendish Laboratory, University of Cambridge, Cambridge, CB3 OHE, U.K.ORCID 0000-0003-2651-1717
Tran Thi Ngoc VanDepartment of Chemical Engineering, Hongik University, Seoul, 04066, Republic of Korea.ORCID 0000-0003-4214-1103
Jung-In LeeDepartment of Materials Science and Metallurgy, University of Cambridge, Cambridge, CB3 OFS, U.K.ORCID 0000-0002-5822-0722
Kihyun LeeDepartment of Physics, Yonsei University, Seoul, 03722, Republic of Korea.ORCID 0000-0003-2468-8447
Nicolas GauriotCavendish Laboratory, University of Cambridge, Cambridge, CB3 OHE, U.K.ORCID 0000-0001-7725-7208
Kyle FrohnaCavendish Laboratory, University of Cambridge, Cambridge, CB3 OHE, U.K.
Takashi TaniguchiResearch Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba 305-0044, Japan.ORCID 0000-0002-1467-3105
Kenji WatanabeResearch Center for Electronic and Optical Materials, National Institute for Materials Science, Tsukuba 305-0044, Japan.ORCID 0000-0003-3701-8119
Bonggeun ShongDepartment of Chemical Engineering, Hongik University, Seoul, 04066, Republic of Korea.
Kwanpyo KimDepartment of Physics, Yonsei University, Seoul, 03722, Republic of Korea.ORCID 0000-0001-8497-2330
Samuel D StranksCavendish Laboratory, University of Cambridge, Cambridge, CB3 OHE, U.K.ORCID 0000-0002-8303-7292
Jong-Hyun AhnSchool of Electrical and Electronic Engineering, Yonsei University, Seoul, 03722, Republic of Korea.ORCID 0000-0002-8135-7719
Manish ChhowallaDepartment of Materials Science and Metallurgy, University of Cambridge, Cambridge, CB3 OFS, U.K.ORCID 0000-0002-8183-4044
Akshay RaoCavendish Laboratory, University of Cambridge, Cambridge, CB3 OHE, U.K.ORCID 0000-0003-4261-0766

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Two-dimensional (2D) transition metal dichalcogenides (TMDs) possess distinct optical and electronic properties, making them promising candidates for optoelectronic applications. Recently, major advances in the wafer-scale growth of TMDs using the metal-organic chemical vapor deposition (MOCVD) have enabled their integration with standard electronics. However, such materials continue to suffer from defects and unwanted doping, which lower semiconductor performance, as exemplified by poor photoluminescence (PL) yield. Chemical treatment protocols have been shown to improve the PL yield in exfoliated and CVD-grown materials. Here, using PL, Raman microscopy, X-ray photoemission spectroscopy (XPS) and density functional theory (DFT) calculations, we develop chemical treatment protocols for wafer-scale MOCVD-grown monolayer MoS

Indexed as

chemical treatmentdefect passivationmetal−organic chemical vapor depositionphotoluminescence enhancementtransition metal dichalcogenides

Identifiers

PMID40994289
PMCPMC12509315

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.