ArticleACS nano2025
Dual-Step Chemical Treatment of Wafer-Scale Metal-Organic Chemical Vapor Deposition Grown Monolayer Molybdenum Disulfides.
Article in ACS nano, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
1 citing paper in PubMed.
- Nonuniform Chemical Passivation Dynamics in Monolayer MoSThe journal of physical chemistry letters · 2026Article
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Authors and funding
16 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Two-dimensional (2D) transition metal dichalcogenides (TMDs) possess distinct optical and electronic properties, making them promising candidates for optoelectronic applications. Recently, major advances in the wafer-scale growth of TMDs using the metal-organic chemical vapor deposition (MOCVD) have enabled their integration with standard electronics. However, such materials continue to suffer from defects and unwanted doping, which lower semiconductor performance, as exemplified by poor photoluminescence (PL) yield. Chemical treatment protocols have been shown to improve the PL yield in exfoliated and CVD-grown materials. Here, using PL, Raman microscopy, X-ray photoemission spectroscopy (XPS) and density functional theory (DFT) calculations, we develop chemical treatment protocols for wafer-scale MOCVD-grown monolayer MoS
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