Evidence map›Paper›PMID 40938044›Full record

ReviewNanomaterials (Basel, Switzerland)2025

A Comprehensive Review of the Nano-Abrasives Key Parameters Influencing the Performance in Chemical Mechanical Polishing.

Houda Bellahsene, Saad Sene, Gautier Félix, Joulia Larionova, Marc Ferrari, Yannick Guari

Abstract readReview
In one paragraph

Review in Nanomaterials (Basel, Switzerland), 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.

0numbers the graph read from it
0cells of the map it votes in
2citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

2 citing papers in PubMed.

  1. Article
  2. Chemical Mechanical Polishing of ZerodurNanomaterials (Basel, Switzerland) · 2025
    Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

6 authors.

Houda BellahseneInstitut Charles Gerhardt Montpellier (ICGM), Centre National de la Recherche Scientifique (CNRS), École Nationale Supérieure de Chimie de Montpellier (ENSCM), University of Montpellier, 34293 Montpellier, France.ORCID 0009-0007-5692-3970
Saad SeneInstitut Charles Gerhardt Montpellier (ICGM), Centre National de la Recherche Scientifique (CNRS), École Nationale Supérieure de Chimie de Montpellier (ENSCM), University of Montpellier, 34293 Montpellier, France.ORCID 0000-0002-2542-3881
Gautier FélixInstitut Charles Gerhardt Montpellier (ICGM), Centre National de la Recherche Scientifique (CNRS), École Nationale Supérieure de Chimie de Montpellier (ENSCM), University of Montpellier, 34293 Montpellier, France.ORCID 0000-0002-2761-6353
Joulia LarionovaInstitut Charles Gerhardt Montpellier (ICGM), Centre National de la Recherche Scientifique (CNRS), École Nationale Supérieure de Chimie de Montpellier (ENSCM), University of Montpellier, 34293 Montpellier, France.
Marc FerrariLaboratoire d'Astrophysique de Marseille (LAM), Centre National de la Recherche Scientifique (CNRS), Centre National d'Etudes Spatiales (CNES), Aix Marseille University, 13013 Marseille, France.
Yannick GuariInstitut Charles Gerhardt Montpellier (ICGM), Centre National de la Recherche Scientifique (CNRS), École Nationale Supérieure de Chimie de Montpellier (ENSCM), University of Montpellier, 34293 Montpellier, France.ORCID 0000-0001-5205-3225

Funding

Agence nationale de la recherche (ANR) ANR-21-LCV1-0013
6 · The paper itself

Abstract

Chemical Mechanical Polishing (CMP) is a critical process in many industries where achieving superior surface quality through controlled material removal rates by using nano-abrasives is essential. This review examines key parameters of abrasives at the nanoscale, such as size, shape, aspect ratio, hardness, and surface modifications, through inorganic doping or organic molecule grafting and their influence on CMP performance. By analyzing recent studies, we explore how these parameters affect the tribological and chemical interactions during CMP and link these effects to the fundamental polishing mechanisms. Highlighting emerging trends, this work offers a roadmap for designing next-generation nano-abrasives that boost removal efficiency, enhance surface finish, and ensure process stability. Ultimately, controlling abrasive properties at the nanoscale is vital for advancing CMP technology toward more efficient, consistent, and high-quality results.

Indexed as

abrasivechemical mechanical polishingnanoparticles

Identifiers

PMID40938044
PMCPMC12430078

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.