Evidence map›Paper›PMID 40809104›Full record

ArticleACS applied polymer materials2025

High- and Low-Fluorescent Photoinitiators for Multiphoton Lithography.

Dimitra Ladika, Michalis Stavrou, Gordon Zyla, Kostas Parkatzidis, Maria Androulidaki, Frederic Dumur, Maria Farsari, David Gray

Abstract read
In one paragraph

Article in ACS applied polymer materials, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Dimitra LadikaInstitute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, 70013 Heraklion, Greece.ORCID https://orcid.org/0000-0003-2909-1949
Michalis StavrouInstitute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, 70013 Heraklion, Greece.ORCID https://orcid.org/0009-0009-3474-5514
Gordon ZylaInstitute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, 70013 Heraklion, Greece.ORCID https://orcid.org/0000-0001-8202-1574
Kostas ParkatzidisDepartment of Chemical Engineering, Stanford University, Stanford, California 94305, United States.ORCID https://orcid.org/0000-0001-7444-7815
Maria AndroulidakiInstitute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, 70013 Heraklion, Greece.
Frederic DumurAix Marseille University, CNRS, ICR, UMR 7273, F-13397 Marseille, France.ORCID https://orcid.org/0000-0003-4872-094X
Maria FarsariInstitute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, 70013 Heraklion, Greece.
David GrayInstitute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, 70013 Heraklion, Greece.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Multiphoton lithography (MPL), an additive manufacturing method, enables the fabrication of intricate three-dimensional micro- and nanostructures with high spatial resolution, crucial for applications in photonics, micro-optics, and biomedicine. Central to the performance of the MPL is the choice of photoinitiator (PI), which governs polymerization efficiency, resolution, and application-specific functionality. However, conventional PIs often suffer from drawbacks such as high autofluorescence and poor spectral selectivity, limiting their utility in fluorescence-sensitive applications. This work presents a systematic study on the nonlinear optical (NLO) properties of lab-made low-fluorescence PIs (LF, indane-1,3-dione-based push-pull compounds), comparing them to high-fluorescence PIs (HF, triphenylamine-based aldehydes), and examines their effectiveness for MPL. The NLO properties of the PIs were investigated employing the two-beam initiation threshold (2-BIT) method and Z-scan technique both in solution and integrated into the hybrid photoresist SZ2080. The characterization of NLO properties and manufacturing tests were performed within a single optical setup, under similar spectrotemporal laser radiation conditions (pulse width, 150 fs; wavelength, 780 nm). This proposed approach allows for a straightforward and efficient evaluation of the suitability of aPI for MPL. LF-PIs were found to be up to 2 orders of magnitude less fluorescent than HF-PIs, as determined by photoluminescence analysis, and exhibited up to 10-fold higher NLO absorption-related parameters. This indicates that high fluorescence may compete with the NLO performance by interfering with absorption processes essential for effective polymerization. Most importantly, LF-PIs enabled structuring performance comparable to that of SBB (a benchmark material for low-fluorescent MPL-fabricated structures) when embedded in SZ2080, and the resulting printed structures exhibited an improved selective fluorescence response, indicating their strong potential for printing scaffolds in biorelated applications, where a high fluorescent signal usually hinders signal detection and analysis.

Indexed as

fluorescenceMultiphoton lithographynonlinear optical propertiesphotoinitiatorspolymerization

Identifiers

PMID40809104
PMCPMC12340759

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.