ArticleACS applied electronic materials2025
Plasma-Induced Tailoring of Graphene Oxide Surfaces for Electrochemical Applications: Functionalization and Etching.
Article in ACS applied electronic materials, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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Who cites it
3 citing papers in PubMed.
- Electrochemical Detection of SMN Protein by Immunosensors: The Role of Surface Modifications in Screen-Printed Carbon Electrodes.Sensors (Basel, Switzerland) · 2026Article
- Fundamental Limitation: How Through-Thickness Heterogeneity in Laser-Reduced Graphene Oxide Compromises Sensor Stability.ACS applied nano materials · 2026Article
- Electrochemical Detection of NO and CaPlasma chemistry and plasma processing · 2026Article
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Authors and funding
5 authors.
Funding
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Abstract
This study investigates the use of radio frequency air plasma as an eco-friendly method to rapidly and reversibly tailor the surface properties of graphene oxide (GO) films. We observed a transition from hydrophilic (contact angle ∼55°) to superhydrophilic (<10°) with short plasma exposure, attributed to a synergistic combination of surface modification and etching. Spectroscopic analyses (FTIR, XPS) revealed early stage formation of carbonyl groups and reduction of hydroxyls, while longer treatments induced atomic-level etching (AFM) and structural changes (XRD). This surface engineering enhanced the dielectric properties of GO films but led to reduced aqueous stability. The elucidated interplay between plasma-induced functionalization and etching provides valuable insights for the controlled modification of GO surfaces for various applications, including advanced dielectrics.
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