Evidence map›Paper›PMID 40717791›Full record

ArticleChemistry of materials : a publication of the American Chemical Society2025

Area-Selective Atomic Layer Deposition through Selective Passivation of SiO

Olaf C A Bolkenbaas, Marc J M Merkx, Nicholas J Chittock, Ilker Tezsevin, Wilhelmus M M Kessels, Tania E Sandoval, Adriaan J M Mackus

Abstract read
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In one paragraph

Article in Chemistry of materials : a publication of the American Chemical Society, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

7 authors.

Olaf C A BolkenbaasDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.ORCID https://orcid.org/0000-0001-5817-9312
Marc J M MerkxDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.ORCID https://orcid.org/0000-0002-3886-0220
Nicholas J ChittockDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.
Ilker TezsevinDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.ORCID https://orcid.org/0000-0001-5648-3943
Wilhelmus M M KesselsDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.ORCID https://orcid.org/0000-0002-7630-8226
Tania E SandovalDepartment of Chemical and Environmental Engineering, Universidad Técnica Federico Santa María, Av. Vicuña Mackenna 3939 Santiago, Chile.ORCID https://orcid.org/0000-0001-9418-5031
Adriaan J M MackusDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.ORCID https://orcid.org/0000-0001-6944-9867

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Area-selective atomic layer deposition (ALD) has gained widespread interest in the semiconductor industry to facilitate the continued drive for more powerful and efficient devices. In this work, we chemically passivate SiO

Identifiers

PMID40717791
PMCPMC12287997

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.