ReviewLight, science & applications2025
Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches.
Review in Light, science & applications, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
6 citing papers in PubMed.
- Review
- A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment.Sensors (Basel, Switzerland) · 2026Article
- Stitch-Less Lithography Empowered by Multi-Dimensional Holography.Nanomaterials (Basel, Switzerland) · 2026Article
- LightIN: a versatile silicon-integrated photonic field programmable gate array with an intelligent configuration framework for next-generation AI clusters.Light, science & applications · 2026Article
- Inverse Lithography Technology (ILT) Under Chip Manufacture Context.Micromachines · 2026Review
- Asymmetric Diffusion Metasurface-Based Lensless Monitoring and Uniform Illumination Systems for Optical Lithography.Research (Washington, D.C.) · 2026Article
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
5 authors.
Funding
Abstract
Inverse lithography technology (ILT) is a promising approach in computational lithography to address the challenges posed by shrinking semiconductor device dimensions. The ILT leverages optimization algorithms to generate mask patterns, outperforming traditional optical proximity correction methods. This review provides an overview of ILT's principles, evolution, and applications, with an emphasis on integration with artificial intelligence (AI) techniques. The review tracks recent advancements of ILT in model improvement and algorithmic efficiency. Challenges such as extended computational runtimes and mask-writing complexities are summarized, with potential solutions discussed. Despite these challenges, AI-driven methods, such as convolutional neural networks, deep neural networks, generative adversarial networks, and model-driven deep learning methods, are transforming ILT. AI-based approaches offer promising pathways to overcome existing limitations and support the adoption in high-volume manufacturing. Future research directions are explored to exploit ILT's potential and drive progress in the semiconductor industry.
Identifiers
What OpenQuestion holds
Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.