ArticleNational science review2025
Deposition of uniform films on complex 3D objects by atomic layer deposition for plasma etch-resistant coatings.
Article in National science review, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
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Who cites it
3 citing papers in PubMed.
- Biomimetic Coacervate Coatings: From Phase Separation Fundamentals to Advanced Biomedical Applications.Biomimetics (Basel, Switzerland) · 2026Review
- Electrohydrodynamic printing technology: mechanisms, control, and applications.Microsystems & nanoengineering · 2026Review
- Atomic Layer Deposition for Perovskite Solar Cells: Interface Engineering, Stability Enhancement, and Future Prospects.Nanomaterials (Basel, Switzerland) · 2025Review
Corrections and comments
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Authors and funding
8 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Atomic layer deposition (ALD) is a layer-by-layer technique for producing conformal, high-quality films, ideal for corrosion-resistant coatings on complex geometries. However, depositing thicker films on complex 3D objects presents challenges in maintaining effective precursor delivery across the surface. This paper describes the design and realization of a method to increase precursor concentration in the boundary layer near the complex object surface by introducing slitted baffles within the chamber. Using -OH surface coverage as a key indicator for assessing the extent of surface reactions, simulation is used to optimize the baffle number and shape. The optimal baffle design reduced surface film non-uniformity on the object surface from 35.46% to 5.75%, shortened the purge time from 12.8 to 9.7 s, and increased precursor utilization by 7%. Ideal Al
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Registered trials
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