Evidence map›Paper›PMID 40521552›Full record

ArticleACS omega2025

Substrate Activated Conformal Deposition Through Interfacial Control by a Soft Energy Intensification Process for Functional Integration in High Performance Artificial Intelligence Computing.

Alain E Kaloyeros, Barry Arkles

Abstract read
In one paragraph

Article in ACS omega, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

2 authors.

Alain E KaloyerosKalark Nanostructure Sciences Inc., 3805 Old Easton Road, Doylestown, Pennsylvania 18902, United States.ORCID https://orcid.org/0000-0002-6872-1707
Barry ArklesKalark Nanostructure Sciences Inc., 3805 Old Easton Road, Doylestown, Pennsylvania 18902, United States.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

We demonstrate a soft energy vapor deposition process that enables atomic level control of the interface between the substrate surface and the growing multilayer film, while ensuring enhanced environmental sustainability and reduced energy consumption. The process combines the use of a low substrate temperature designed to induce selective ligand removal upon precursor interaction with the substrate surface, which we refer to as the "substrate surface activated" process, with the subsequent application of a soft plasma (ion energies below 5 eV and plasma power density below 0.05 W/cm

Identifiers

PMID40521552
PMCPMC12163818

What OpenQuestion holds

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LicenceCC BY-NC-ND
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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.