ArticleMaterials (Basel, Switzerland)2025
Optimization of Diamond Polishing Process for Sub-Nanometer Roughness Using Ar/O
Article in Materials (Basel, Switzerland), 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
2 citing papers in PubMed.
- Progress in the Fabrication and Optimization of High-Energy Diamond X-Ray Refractive Lenses.Micromachines · 2026Review
- Mitigating the Thermal Bottleneck in Polycrystalline Diamond Films by Gradient ICP Etching of the Nucleation Layer.Materials (Basel, Switzerland) · 2026Article
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
8 authors.
Funding
Abstract
Diamond, known for its exceptional physical and chemical properties, shows great potential in advanced fields such as medicine, semiconductors, and optics. However, reducing surface roughness is critical for enhancing its performance. This study employs inductively coupled plasma (ICP) polishing to etch single-crystal diamond and analyzes the impact of different etching parameters on surface roughness using atomic force microscopy (AFM). Using the change in surface roughness before and after etching as the main evaluation metric, the optimal etching parameters were determined: Ar/O
Indexed as
Identifiers
What OpenQuestion holds
Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.