ArticleNature communications2025
Low temperature deposition of functional thin films on insulating substrates enabled by selective ion acceleration using synchronized floating potential HiPIMS.
Article in Nature communications, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 4 papers.
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Who cites it
4 citing papers in PubMed.
- Low Temperature Growth of High-Quality Wurtzite Ferroelectric Through Quasi-van der Waals Epitaxy.Advanced materials (Deerfield Beach, Fla.) · 2026Article
- Autonomous sampling and SHAP interpretation of deposition-rates in bipolar HiPIMS.Digital discovery · 2026Article
- Research on Plasma Characteristics of High-Power Impulse Magnetron Sputtering Ti-Nb-Cr Target and Its Effect on Film Properties.Materials (Basel, Switzerland) · 2026Article
- Current View of Nanoindentation: Recent Developments and Application in Material Characterization.ACS applied materials & interfaces · 2025Review
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Authors and funding
5 authors.
Funding
Abstract
Ionized physical vapor deposition techniques, such as high-power impulse magnetron sputtering (HiPIMS), are gaining popularity but face challenges for deposition on insulating materials, where applying negative potentials for ion acceleration is difficult. While radio frequency biasing works on insulators, it risks film damage from energetic process gas ions. Here, we present Synchronized Floating Potential HiPIMS (SFP-HiPIMS), which exploits the substrate's transient negative floating potential during HiPIMS discharges. By timing the ion arrival with this negative potential, selective metal-ion acceleration can be achieved, improving adatom mobility while minimizing energetic Ar
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Registered trials
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