Evidence map›Paper›PMID 40352568›Full record

ArticleACS omega2025

Atomic-Layer-Deposition-Assisted Interfacial Engineering of Metal-Oxide-Metal Devices via Multilayer Structures to Improve Leakage Characteristics.

Zhao-Cheng Chen, Hao-Jung Liu, Yu-Chi Chang, Shoou-Jinn Chang

Abstract read
In one paragraph

Article in ACS omega, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

4 authors.

Zhao-Cheng ChenInstitute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan.
Hao-Jung LiuDepartment of Engineering Science, National Cheng Kung University, Tainan 70101, Taiwan.
Yu-Chi ChangDepartment of Engineering Science, National Cheng Kung University, Tainan 70101, Taiwan.ORCID https://orcid.org/0000-0003-2253-935X
Shoou-Jinn ChangInstitute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

The defect-controlled charge transfer mechanism in insulators is crucial for advanced electronic devices. In this study, metal/insulator/metal devices with a multilayer stacked structure are developed in which the off-state current value is reduced by 1 order of magnitude compared to a single-layer structure by modulating the deposition conditions of the atomic layer deposition system. The results of x-ray photoelectron spectroscopy suggest that the pressure modulation of the atomic layer deposition system drives the formation of hydroxyl groups. The different band structures formed by such an oxide layer with more hydroxyl groups further affected the current transport. The possible pathways for carrier transport are presented in detail through electrical analysis and provide the potential for different energy band multilayer stacked structures as advanced electronic devices.

Identifiers

PMID40352568
PMCPMC12059951

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.