Evidence map›Paper›PMID 40317627›Full record

ArticleSmall methods2025

Tailoring in-Plane Permittivity Gradients by Shadow Mask Molecular Beam Epitaxy.

Shagorika Mukherjee, Sai Rahul Sitaram, Mingyu Yu, Xi Wang, Stephanie Law

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Small methods, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

5 authors.

Shagorika MukherjeeDepartment of Materials Science and Engineering, University of Delaware, 201 Dupont Hall, 127 The Green, Newark, DE, 19716, USA.
Sai Rahul SitaramDepartment of Materials Science and Engineering, University of Delaware, 201 Dupont Hall, 127 The Green, Newark, DE, 19716, USA.
Mingyu YuDepartment of Materials Science and Engineering, University of Delaware, 201 Dupont Hall, 127 The Green, Newark, DE, 19716, USA.
Xi WangDepartment of Materials Science and Engineering, University of Delaware, 201 Dupont Hall, 127 The Green, Newark, DE, 19716, USA.
Stephanie LawDepartment of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, 16802, USA.ORCID https://orcid.org/0000-0002-5087-6663

Funding

Division of Electrical, Communications and Cyber Systems ECCS-2102027Division of Materials Research DMR-2011824
6 · The paper itself

Abstract

Infrared (IR) gradient permittivity materials are the potential building blocks of miniature IR-devices such as an on-chip spectrometer. The manufacture of materials with permittivities that vary in the horizontal plane is demonstrated using shadow mask molecular beam epitaxy in Si:InAs films. However, to be useful, the permittivity gradient needs to be of high crystalline quality and its properties need to be tunable. In this paper, it is shown that it can control the permittivity gradient length and steepness by varying the shadow mask thickness. Samples grown with similar growth parameters and with 200 and 500 µm mask thicknesses show permittivity gradient widths of 18 and 39 µm on the flat mesa on one side and 11 and 23 µm on the film slope on the other side, respectively. The gradient steepnesses are 23.3 and 11.3 cm

Indexed as

gradient permittivity materialsinfraredmolecular beam epitaxyoptoelectronicssemiconductorsshadow masks

Identifiers

PMID40317627
PMCPMC12391625

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.