Evidence map›Paper›PMID 40283302›Full record

ArticleMicromachines2025

The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin Films.

Debottam Datta, Ali Eskandari, Junaid Syed, Himanshu Rai, Nitya Nand Gosvami, Ting Y Tsui

Abstract read
In one paragraph

Article in Micromachines, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

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1 · What the graph read from it

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2 · The registry

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3 · Its place in the literature

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4 · The record

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5 · Who and what money

Authors and funding

6 authors.

Debottam DattaDepartment of Materials Science & Engineering, Indian Institute of Technology Delhi Hauz Khas, New Delhi 110016, India.ORCID 0000-0003-0053-3571
Ali EskandariDepartment of Chemical Engineering, University of Waterloo, 200 University Avenue West, Waterloo, ON N2L 3G1, Canada.
Junaid SyedDepartment of Materials Science & Engineering, Indian Institute of Technology Delhi Hauz Khas, New Delhi 110016, India.
Himanshu RaiDepartment of Materials Science & Engineering, Indian Institute of Technology Delhi Hauz Khas, New Delhi 110016, India.ORCID 0000-0003-3564-8475
Nitya Nand GosvamiDepartment of Materials Science & Engineering, Indian Institute of Technology Delhi Hauz Khas, New Delhi 110016, India.
Ting Y TsuiDepartment of Chemical Engineering, University of Waterloo, 200 University Avenue West, Waterloo, ON N2L 3G1, Canada.ORCID 0000-0001-6291-9870

Funding

Indian Institute of Technology Delhi - University of Waterloo Multi-Institutional Faculty Interdis-ciplinary Research Project Proposal (MFIRP Project) 2022Natural Sciences and Engineering Research Council RGPIN-2019-04935Waterloo Institute for Nanotechnology Interdisciplinary Research Fund Program 2020
6 · The paper itself

Abstract

Tantalum metal and tantalum oxide thin films are commonly used in semiconductor devices, protective coatings, and biomedical implants. However, there is limited information on their nanotribological behavior and small-scale mechanical properties. This study characterized the chemical, mechanical, and tribological properties of as-deposited and 400 °C annealed β-Ta thin films using nanoindentation and atomic force microscope (AFM)-based nanoscale friction and wear tests. X-ray photoelectron spectroscopy (XPS) results revealed that a thermally grown Ta oxide layer forms on the surface of Ta film after being annealed at 400 °C. The nanoindentation data indicated an increase in both the hardness and elastic modulus in the heat-treated sample compared to the as-deposited Ta film (13.1 ± 1.3 GPa vs. 12.0 ± 1.4 GPa for hardness) and (213.1 ± 12.7 GPa vs. 175.2 ± 12.3 GPa for elastic modulus). Our nanotribological results show that the friction increased and wear resistance decreased on the surface of the annealed sample compared to the as-deposited Ta film. This discrepancy may be caused by the oxidation of Ta on the film surface, which induces residual compressive stresses in the film and degrades its wear resistance. Our results highlight the influence of thermal annealing and oxidation on nanotribological behavior and small-scale mechanical properties of Ta thin films.

Indexed as

elastic modulusfrictionhardnessnanotribologytantalumwear

Identifiers

PMID40283302
PMCPMC12029189

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