Evidence map›Paper›PMID 40040608›Full record

ArticleAdvanced science (Weinheim, Baden-Wurttemberg, Germany)2025

Nanoscale Resist-Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography.

Weina Li, Tianlei Ma, Pengyi Tang, Yunhong Luo, Hui Zhang, Jun Zhao, Rob Ameloot, Min Tu

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Advanced science (Weinheim, Baden-Wurttemberg, Germany), 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.

0numbers the graph read from it
0cells of the map it votes in
5citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

5 citing papers in PubMed.

  1. Review
  2. ACS omega · 2026
    Article
  3. Article
  4. VIS-XUV Optical Constants and Electronic Band Parameters of a Tin-Oxo Cage Photoresist (SnThe journal of physical chemistry. C, Nanomaterials and interfaces · 2025
    Article
  5. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Weina LiState Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China.
Tianlei MaState Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China.ORCID https://orcid.org/0000-0003-2911-4717
Pengyi TangState Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China.
Yunhong LuoShanghaiTech University, School of physical science and technology, Shanghai, 201210, China.
Hui ZhangShanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China.
Jun ZhaoShanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China.
Rob AmelootCentre for Membrane Separations, Adsorption, Catalysis and Spectroscopy, KU Leuven, Leuven, 3001, Belgium.ORCID https://orcid.org/0000-0003-3178-5480
Min TuState Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China.ORCID https://orcid.org/0000-0003-4751-3877

Funding

EU's H2020 654360National Key Research and Development Program of China 2021YFB3200800National Natural Science Foundation of China 22201289Research Foundation Flanders G087422NResearch Foundation Flanders G85720NShanghai Synchrotron Radiation Facility, China
6 · The paper itself

Abstract

Advancements in patterning techniques for metal-organic frameworks (MOFs) are crucial for their integration into microelectronics. However, achieving precise nanoscale control of MOF structures remains challenging. In this work, a resist-free method for patterning MOFs is demonstrated using extreme ultraviolet (EUV) lithography with a resolution of 40 nm. The role of halogen atoms in the linker and the effect of humidity are analyzed through in situ and near-ambient pressure synchrotron X-ray photoelectron spectroscopy. In addition to facilitating the integration of MOFs, the results offer valuable insights for developing the highly sought-after positive-tone EUV photoresists.

Indexed as

EUV lithographymetal–organic frameworksresist‐free patterningthin filmszeolitic imidazolate frameworks

Identifiers

PMID40040608
PMCPMC12021036

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.