ArticleMicrosystems & nanoengineering2025
Global alignment reference strategy for laser interference lithography pattern arrays.
Article in Microsystems & nanoengineering, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 9 papers.
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Who cites it
9 citing papers in PubMed.
- Image Formation and Resolution in Spatially Variant Coherent Imaging Systems.Sensors (Basel, Switzerland) · 2026Article
- A Comprehensive Review of Optical Metrology and Perception Technologies.Sensors (Basel, Switzerland) · 2025Review
- A Review of Optical Metrology Techniques for Advanced Manufacturing Applications.Micromachines · 2025Review
- A Review: Grating Encoder Technologies for Multi-Degree-of-Freedom Spatial Measurement.Sensors (Basel, Switzerland) · 2025Review
- A Review: Absolute Linear Encoder Measurement Technology.Sensors (Basel, Switzerland) · 2025Review
- Interference Field Control for High-Uniformity Nanopatterning: A Review.Sensors (Basel, Switzerland) · 2025Review
- Cross-scale structures fabrication via hybrid lithography for nanolevel positioning.Microsystems & nanoengineering · 2025Article
- A Review on Recent Advances in Signal Processing in Interferometry.Sensors (Basel, Switzerland) · 2025Review
- Technologies for Fabricating Large-Size Diffraction Gratings.Sensors (Basel, Switzerland) · 2025Review
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Authors and funding
4 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Large-area gratings play a crucial role in various engineering fields. However, traditional interference lithography is limited by the size of optical component apertures, making large-area fabrication a challenging task. Here, a method for fabricating laser interference lithography pattern arrays with a global alignment reference strategy is proposed. This approach enables alignment of each area of the laser interference lithography pattern arrays, including phase, period, and tilt angle. Two reference gratings are utilized: one is detached from the substrate, while the other remains fixed to it. To achieve global alignment, the exposure area is adjusted by alternating between moving the beam and the substrate. In our experiment, a 3 × 3 regions grating array was fabricated, and the -1st-order diffraction wavefront measured by the Fizeau interferometer exhibited good continuity. This technique enables effective and efficient alignment with high accuracy across any region in an interference lithography pattern array on large substrates. It can also serve as a common technique for fabricating various types of periodic structures by rotating the substrate.
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Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.