ArticleThe journal of physical chemistry letters2025
Using a Heavy Inert Diffusion Additive for Superconformal Atomic Layer Deposition.
Article in The journal of physical chemistry letters, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.
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Who cites it
1 citing paper in PubMed.
- Atomic Layer Deposition for Perovskite Solar Cells: Interface Engineering, Stability Enhancement, and Future Prospects.Nanomaterials (Basel, Switzerland) · 2025Review
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Authors and funding
5 authors.
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Abstract
The shrinking of device nodes increases the demand for deposition processes to seamlessly fill nanometer-scale features. Despite the precision of atomic layer deposition (ALD), it cannot deposit in a V-shaped fashion, which is characteristic of superconformal thin-film deposition. We propose a strategy for superconformal ALD by adding a heavy inert gas as a diffusion additive. We show that the step coverage in an 18:1 aspect ratio feature increased from 1 to 1.6 with the addition of Kr in an ALD process for AlN from Al(CH
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Registered trials
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