Evidence map›Paper›PMID 39968333›Full record

ArticleThe journal of physical chemistry. C, Nanomaterials and interfaces2025

Plasma-Enhanced Spatial Atomic Layer Deposition on 2D and 3D Surface Topologies: The Case of Amorphous and Crystalline TiO

Mike van de Poll, Jie Shen, James Hilfiker, Marcel Verheijen, Paul Poodt, Fieke van den Bruele, Wilhelmus Kessels, Bart Macco

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In one paragraph

Article in The journal of physical chemistry. C, Nanomaterials and interfaces, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Mike van de PollDepartment of Applied Physics and Science Education, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands.ORCID https://orcid.org/0000-0001-8161-3658
Jie ShenTNO/Holst Centre, High Tech Campus 31, 5656 AE Eindhoven, The Netherlands.ORCID https://orcid.org/0009-0001-8331-2610
James HilfikerJ.A. Woollam Co., Inc., 311 South Seventh Street, Lincoln, Nebraska 68508, United States.
Marcel VerheijenDepartment of Applied Physics and Science Education, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands.ORCID https://orcid.org/0000-0002-8749-7755
Paul PoodtDepartment of Applied Physics and Science Education, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands.
Fieke van den BrueleTNO/Holst Centre, High Tech Campus 31, 5656 AE Eindhoven, The Netherlands.
Wilhelmus KesselsDepartment of Applied Physics and Science Education, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands.ORCID https://orcid.org/0000-0002-7630-8226
Bart MaccoDepartment of Applied Physics and Science Education, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands.ORCID https://orcid.org/0000-0003-1197-441X

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Plasma-enhanced spatial ALD (PE-s-ALD) is an interesting technique for high-volume manufacturing of thin films at low-temperature. This technique is particularly appealing for conformal depositions on 3D surfaces for various applications, such as optical coatings, electrolyzers, and batteries. However, various crystallization and growth effects can influence the final film profile and properties, and understanding these effects and their interplay is key. This study investigates the complex growth mechanism of TiO

Identifiers

PMID39968333
PMCPMC11831676

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.