Evidence map›Paper›PMID 39954210›Full record

ReviewNano convergence2025

Recent advances in CMOS-compatible synthesis and integration of 2D materials.

Ajit Kumar Katiyar, Jonggyu Choi, Jong-Hyun Ahn

Abstract readReview
In one paragraph

Review in Nano convergence, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.

0numbers the graph read from it
0cells of the map it votes in
5citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

5 citing papers in PubMed.

  1. Antimony-contact MoSMicrosystems & nanoengineering · 2026
    Article
  2. Review
  3. Low Temperature MOCVD Synthesis of High-Mobility 2D InSe.Small (Weinheim an der Bergstrasse, Germany) · 2026
    Article
  4. Article
  5. Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

3 authors.

Ajit Kumar KatiyarSchool of Electrical and Electronic Engineering, Yonsei University, Seoul, 03722, Republic of Korea.
Jonggyu ChoiSchool of Electrical and Electronic Engineering, Yonsei University, Seoul, 03722, Republic of Korea.
Jong-Hyun AhnSchool of Electrical and Electronic Engineering, Yonsei University, Seoul, 03722, Republic of Korea. ahnj@yonsei.ac.kr.ORCID http://orcid.org/0000-0002-8135-7719

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

The upcoming generation of functional electronics in the era of artificial intelligence, and IoT requires extensive data storage and processing, necessitating further device miniaturization. Conventional Si CMOS technology is struggling to enhance integration density beyond a certain limit to uphold Moore's law, primarily due to performance degradation at smaller dimensions caused by various physical effects, including surface scattering, quantum tunneling, and other short-channel effects. The two-dimensional materials have emerged as highly promising alternatives, which exhibit excellent electrical and mechanical properties at atomically thin thicknesses and show exceptional potential for future CMOS technology. This review article presents the chronological progress made in the development of two-dimensional materials-based CMOS devices with comprehensively discussing the advancements made in material production, device development, associated challenges, and the strategies to address these issues. The future prospects for the use of two-dimensional materials in functional CMOS circuitry are outlooked, highlighting key opportunities and challenges toward industrial adaptation.

Indexed as

2D materialsCMOS devicesFlexible electronicsM3D integrationTMDs

Identifiers

PMID39954210
PMCPMC11829894

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.