ArticleMaterials (Basel, Switzerland)2025
Tribo-Electrochemical Mechanism of Material Removal Examined for Chemical Mechanical Planarization of Stainless-Steel Using Citrate Buffer as a Complexing Agent.
Article in Materials (Basel, Switzerland), 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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Abstract
Chemical mechanical planarization (CMP) is a technique used to efficiently prepare defect-free, flat surfaces of stainless steel (SS) foils and sheets that are implemented in various modern devices. CMP uses (electro)chemical reactions to structurally weaken the surface layers of a workpiece for easy removal by low-pressure mechanical abrasion. Using a model CMP system of 316/316L stainless steel (SS) in an acidic (pH = 3.63) slurry with alumina abrasives, citrate buffer (CB), and H
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