Evidence map›Paper›PMID 39854467›Full record

ArticleScience advances2025

Nanophotonic inspection of deep-subwavelength integrated optoelectronic chips.

Ying Che, Tianyue Zhang, Xiaowei Liu, Dejiao Hu, Shichao Song, Yan Cai, Yaoyu Cao, Jie Zhang, Shi-Wei Chu, Xiangping Li

Abstract read
In one paragraph

Article in Science advances, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

10 authors.

Ying CheState Key Laboratory of Information Photonics and Optical Communications & School of Integrated Circuits, Beijing University of Posts and Telecommunications, Beijing 100876, China.ORCID 0009-0004-1646-5862
Tianyue ZhangState Key Laboratory of Information Photonics and Optical Communications & School of Integrated Circuits, Beijing University of Posts and Telecommunications, Beijing 100876, China.ORCID 0000-0003-0049-703X
Xiaowei LiuResearch Center for Humanoid Sensing, Zhejiang Lab, Hangzhou 311121, China.
Dejiao HuGuangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications, Institute of Photonics Technology, Jinan University, Guangzhou 510632, China.ORCID 0000-0003-2491-909X
Shichao SongGuangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications, Institute of Photonics Technology, Jinan University, Guangzhou 510632, China.
Yan CaiShanghai Institute of Microsystem and Information Technology, Shanghai 200050, China.
Yaoyu CaoGuangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications, Institute of Photonics Technology, Jinan University, Guangzhou 510632, China.
Jie ZhangState Key Laboratory of Information Photonics and Optical Communications & School of Integrated Circuits, Beijing University of Posts and Telecommunications, Beijing 100876, China.
Shi-Wei ChuDepartment of Physics, National Taiwan University, Taipei 10617, Taiwan.ORCID 0000-0001-7728-4329
Xiangping LiGuangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications, Institute of Photonics Technology, Jinan University, Guangzhou 510632, China.ORCID 0000-0003-0955-2613

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Artificial nanostructures with ultrafine and deep-subwavelength features have emerged as a paradigm-shifting platform to advanced light-field management, becoming key building blocks for high-performance integrated optoelectronics and flat optics. However, direct optical inspection of integrated chips remains a missing metrology gap that hinders quick feedback between design and fabrications. Here, we demonstrate that photothermal nonlinear scattering microscopy can be used for direct imaging and resolving of integrated optoelectronic chips beyond the diffraction limit. We reveal that the inherent coupling among deep-subwavelength nanostructures supporting leaky resonances allows for the pronounced heating effect to access reversible nonlinear modulations of the confocal reflection intensity, yielding optical resolving power down to 80 nm (~λ/7). The versatility of this approach has been exemplified by imaging silicon grating couplers and metalens with minimum critical dimensions of 100 nm, as well as central processing unit chip with 45-nm technology, unfolding the long-sought possibility of in situ, nondestructive, high-throughput optical inspection of integrated optoelectronic and nanophotonic chips.

Identifiers

PMID39854467
PMCPMC11759039

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.