Evidence map›Paper›PMID 39852753›Full record

ArticleNanomaterials (Basel, Switzerland)2025

A Microfabrication Technique for High-Performance Diffractive Optical Elements Tailored for Numerical Simulation.

Xingang Dai, Yanjun Hu, Bowen Niu, Qun Dai, Yu Ao, Hongru Zhang, Gaoshan Jing, Yuan Li, Guofang Fan

Abstract read
In one paragraph

Article in Nanomaterials (Basel, Switzerland), 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Advanced Manufacturing on Nano- and Microscale.Nanomaterials (Basel, Switzerland) · 2025
    Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

9 authors.

Xingang DaiKey Laboratory of All Optical Network and Advanced Telecommunication Network, Ministry of Education, Institute of Lightwave Technology, Beijing Jiaotong University, Beijing 100044, China.
Yanjun HuKey Laboratory of All Optical Network and Advanced Telecommunication Network, Ministry of Education, Institute of Lightwave Technology, Beijing Jiaotong University, Beijing 100044, China.
Bowen NiuKey Laboratory of All Optical Network and Advanced Telecommunication Network, Ministry of Education, Institute of Lightwave Technology, Beijing Jiaotong University, Beijing 100044, China.
Qun DaiKey Laboratory of All Optical Network and Advanced Telecommunication Network, Ministry of Education, Institute of Lightwave Technology, Beijing Jiaotong University, Beijing 100044, China.
Yu AoKey Laboratory of All Optical Network and Advanced Telecommunication Network, Ministry of Education, Institute of Lightwave Technology, Beijing Jiaotong University, Beijing 100044, China.
Hongru ZhangInstitute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China.
Gaoshan JingInstitute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China.ORCID 0000-0002-5246-1314
Yuan LiShanghai Institute of Measurement and Testing Technology, National Center of Measurement and Testing for East China, National Center of Testing Technology, Shanghai 201203, China.
Guofang FanKey Laboratory of All Optical Network and Advanced Telecommunication Network, Ministry of Education, Institute of Lightwave Technology, Beijing Jiaotong University, Beijing 100044, China.

Funding

Fundamental Research Funds for the Central Universities 2022JBZY011
6 · The paper itself

Abstract

Diffractive optical elements (DOEs) are specialized optical components that manipulate light through diffraction for various applications, including holography, spectroscopy, augmented reality (AR) and virtual reality (VR), and light detection and ranging (LiDAR). The performance of DOEs is highly determined by fabricated materials and fabrication methods, in addition to the numerical simulation design. This paper presents a microfabrication technique optimized for DOEs, enabling precise control of critical parameters, such as refractive index (RI) and thickness. Using photolithography, we fabricated high-precision photoresist patterns on silicon and sapphire substrates, with 3 × 3 and 3 × 5 DOE beam splitter as examples. The results show a strong match between simulation and experimental data, with discrepancies of just 0.53% and 0.57% for DOE on silicon and sapphire substrates, respectively. This approach offers potential for advancing high-performance DOE devices in semiconductor manufacturing, supporting next-generation optical systems.

Indexed as

diffractive optical elementmicrofabricationphotolithographyuniformity

Identifiers

PMID39852753
PMCPMC11767437

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.