Evidence map›Paper›PMID 39808804›Full record

ArticleACS applied materials & interfaces2025

Photoemission Study of GaN Passivation Layers and Band Alignment at GaInP(100) Heterointerfaces.

Sahar Shekarabi, Mohammad Amin Zare Pour, Haoqing Su, Wentao Zhang, Chengxing He, Kai Daniel Hanke, Oleksandr Romanyuk, Agnieszka Paszuk, Wolfram Jaegermann, Shu Hu and 1 more

Abstract read
In one paragraph

Article in ACS applied materials & interfaces, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

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0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

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2 · The registry

The trial behind it

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3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

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5 · Who and what money

Authors and funding

11 authors.

Sahar ShekarabiGrundlagen von Energiematerialien, Institut für Physik, Technische Universität Ilmenau, 98693 Ilmenau, Germany.ORCID 0000-0002-0846-4534
Mohammad Amin Zare PourGrundlagen von Energiematerialien, Institut für Physik, Technische Universität Ilmenau, 98693 Ilmenau, Germany.
Haoqing SuDepartment of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06520, United States.
Wentao ZhangDepartment of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06520, United States.ORCID 0009-0003-7828-6096
Chengxing HeDepartment of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06520, United States.ORCID 0000-0003-4716-6078
Kai Daniel HankeGrundlagen von Energiematerialien, Institut für Physik, Technische Universität Ilmenau, 98693 Ilmenau, Germany.
Oleksandr RomanyukFZU - Institute of Physics of the Czech Academy of Sciences, Prague 16200, Czech Republic.ORCID 0000-0003-0430-3706
Agnieszka PaszukGrundlagen von Energiematerialien, Institut für Physik, Technische Universität Ilmenau, 98693 Ilmenau, Germany.
Wolfram JaegermannSurface Science Laboratory, Department of Materials and Earth Sciences, Technische Universität Darmstadt, 64287 Darmstadt, Germany.
Shu HuDepartment of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06520, United States.ORCID 0000-0002-5041-0169
Thomas HannappelGrundlagen von Energiematerialien, Institut für Physik, Technische Universität Ilmenau, 98693 Ilmenau, Germany.ORCID 0000-0002-6307-9831

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

To date, III-V semiconductor-based tandem devices with GaInP top photoabsorbers show the highest solar-to-electricity or solar-to-fuel conversion efficiencies. In photoelectrochemical (PEC) cells, however, III-V semiconductors are sensitive, in terms of photochemical stability and, therefore, require suitable functional layers for electronic and chemical passivation. GaN films are discussed as promising options for this purpose. The band alignment between such a protection layer and the III-V semiconductor should be aligned to minimize corrosion and nonradiative interfacial recombination and to promote selective charge carrier transport. Here, we investigate the band alignment between GaN passivation layers and n-type doped GaInP(100) photoabsorbers and grew n-type GaInP(100) epitaxially by metalorganic vapor phase epitaxy on oxidized GaAs(100) substrates to mimic a realistic preparation sequence. We prepared 1-20 nm GaN films on top employing atomic layer deposition and studied the band alignment at the GaN/GaInP(100) heterointerface by X-ray and ultraviolet photoelectron spectroscopy. Due to the limited emission depth of photoelectrons, we determined the band alignment by a series of measurements, in which we increased the thickness of the GaN films successively. The n-GaInP(100) surfaces, prepared with a well-known phosphorus-terminated p(2 × 2)/c(4 × 2) reconstruction, show an upward surface band bending (BB) of 0.38 eV and a Fermi level pinning due to the present surface states. Upon oxidation, the surface states are partially passivated, resulting in a reduction of the BB to 0.16 eV and a valence band offset (VBO) between the GaInP(100) and the thin oxide layer of 2.01 eV. Applying Kraut's approach, we identified a VBO of 1.90 eV and a conduction band offset of 0.44 eV between GaInP(100) with a thin oxide layer and the GaN passivation layer. We conclude that the GaN is a well-suited passivation layer for PEC cells and facilitates selective transport of photogenerated electrons.

Indexed as

band alignmentGaNIII−V semiconductorMOVPEpassivation layerphotoelectrochemical cellsolar energy conversion

Identifiers

PMID39808804
PMCPMC11788992

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