Review in Materials (Basel, Switzerland), 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.
0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
2 · The registry
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
5 · Who and what money
Authors and funding
14 authors.
Maciej KamińskiInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.ORCID 0000-0002-7519-2233
Krystian KrólInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.ORCID 0000-0002-4965-7906
Norbert KwietniewskiInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.ORCID 0000-0002-5672-9744
Marcin MyśliwiecInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.ORCID 0000-0002-7521-077X
Mariusz SochackiInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.ORCID 0000-0001-5389-8588
Bartłomiej StonioInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.
Ryszard KisielInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.ORCID 0000-0002-4028-2466
Agnieszka MartychowiecInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.ORCID 0000-0003-2769-2505
Katarzyna Racka-SzmidtŁukasiewicz Research Network-Institute of Microelectronics and Photonics, 32/46 Al. Lotników, 02-668 Warsaw, Poland.
Aleksander WerbowyInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.
Jarosław ŻelazkoŁukasiewicz Research Network-Institute of Microelectronics and Photonics, 32/46 Al. Lotników, 02-668 Warsaw, Poland.ORCID 0000-0002-4587-2676
Piotr NiedzielskiInstitute of Materials Science and Engineering, Lodz University of Technology, 1/15 Stefanowskiego Str., 90-537 Łódź, Poland.ORCID 0000-0002-6966-9154
Jan SzmidtInstitute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland.
Andrzej StrójwąsCarnegie Mellon University, 5000 Forbes Avenue, Pittsburgh, PA 15213, USA.
Funding
National Centre for Research and Development TECHMATSTRATEG1/346922/4/NCBR/2017Warsaw University of Technology POB FOTECH-3
6 · The paper itself
Abstract
Arguably, SiC technology is the most rapidly expanding IC manufacturing technology driven mostly by the aggressive roadmap for battery electric vehicle penetration and also industrial high-voltage/high-power applications. This paper provides a comprehensive overview of the state of the art of SiC technology focusing on the challenges starting from the difficult and lengthy SiC substrate growth all the way to the complex MOSFET assembly processes. We focus on the differentiation from the established Si manufacturing processes and provide a comprehensive list of references as well as a brief description of our own research into the key manufacturing processes in this technology. We also present a SiC technology and product roadmap.
Indexed as
automotive industrybattery electric vehiclesSiC MOSFETSiC technology
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.
The Overview of Silicon Carbide Technology: Status, Challenges, Key Drivers, and Product Roadmap. · full record | OpenQuestion