ArticleACS omega2024
Effect of Ar on Temperature and Flow Distribution in Monocrystalline Graphene Growth: Inert Gas Is Active.
Article in ACS omega, 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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10 authors.
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Abstract
Monocrystalline graphene growth has always been an intriguing research focus. Argon (Ar) is merely viewed as a carrier gas due to its inert chemical properties throughout the whole growth procedure by the chemical vapor deposition method. In this work, the influence of Ar on temperature and flow fields was investigated in consideration of its physical parameter difference among all involved gases. Results by experimental characterization and fluid dynamics simulation showed that the temperature elevated, and the velocity of the mixed gas increased as the Ar flow rates rose. Furthermore, the deposition rate of C on the Cu surface, representing graphene generation rate, was studied as the Ar flow rate changed in combination with CH
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