ReviewAdvanced healthcare materials2025
Area Selective Atomic Layer Deposition for the Use on Active Implants: An Overview of Available Process Technology.
Review in Advanced healthcare materials, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.
What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
1 citing paper in PubMed.
- Area Selective Atomic Layer Deposition for the Use on Active Implants: An Overview of Available Process Technology.Advanced healthcare materials · 2025Review
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
3 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Area-selective atomic layer deposition (ASD) is a bottom-up process that is of particular importance in the semiconductor industry, as it prevents edge defects and avoids cost-intensive lithography steps. This approach not only offers immense potential for the manufacture of active implants but can also be used to improve them. This review paper presents various processes that can be used for this purpose. It also identifies aspects that shall be considered when implementing such a process for medical applications. For example, the inherent selectivity can be used to produce new biosensors, the passivated ASD can be used to encapsulate polymer-based implants, and the activated ASD can be used to improve electrode performance. Finally, the aspects that shall be considered in a coating for active implants are highlighted. ASD therefore offers great potential for use on active implants.
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Registered trials
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