Evidence map›Paper›PMID 39707996›Full record

ArticleACS nano2025

Reconfiguring van der Waals Metal-Semiconductor Contacts via Selenium Intercalation/Deintercalation Post-Treatment.

Gihyeon Kwon, Hyeon-Sik Kim, Kwangsik Jeong, Sewoong Oh, Dajung Kim, Woochan Koh, Hyunjun Park, Seongil Im, Mann-Ho Cho

Abstract read
In one paragraph

Article in ACS nano, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.

0numbers the graph read from it
0cells of the map it votes in
5citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

5 citing papers in PubMed.

  1. Article
  2. Article
  3. Article
  4. Article
  5. Ultrafast Self-Driven WSeAdvanced science (Weinheim, Baden-Wurttemberg, Germany) · 2025
    Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

9 authors.

Gihyeon KwonDepartment of Physics, Yonsei University, Seoul 03722, Republic of Korea.
Hyeon-Sik KimDepartment of Physics, Yonsei University, Seoul 03722, Republic of Korea.
Kwangsik JeongDivision of AI Semiconductor, Yonsei University, Wonju 26493, Republic of Korea.ORCID 0000-0002-2804-7092
Sewoong OhDepartment of Physics, Yonsei University, Seoul 03722, Republic of Korea.
Dajung KimDepartment of Physics, Yonsei University, Seoul 03722, Republic of Korea.
Woochan KohDepartment of Physics, Yonsei University, Seoul 03722, Republic of Korea.
Hyunjun ParkDepartment of Physics, Yonsei University, Seoul 03722, Republic of Korea.
Seongil ImDepartment of Physics, Yonsei University, Seoul 03722, Republic of Korea.ORCID 0000-0002-7993-0715
Mann-Ho ChoDepartment of Physics, Yonsei University, Seoul 03722, Republic of Korea.ORCID 0000-0002-5621-3676

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

To achieve the commercialization of two-dimensional (2D) semiconductors, the identification of an appropriate combination of 2D semiconductors and three-dimensional (3D) metals is crucial. Furthermore, understanding the van der Waals (vdW) interactions between these materials in thin-film semiconductor processes is essential. Optimizing these interactions requires precise control over the properties of the vdW interface through specific pre- or post-treatment methods. This study utilizes Se-environment annealing as a post-treatment technique, which allows for modification of the vdW gap distance and enhancement of the stability of the interfacial structure through the process of Se intercalation and deintercalation at the 2D-3D interface. The depth of Se intercalation and deintercalation is adjusted by varying the temperature and duration of the postannealing process in an Se environment. This precise control over the process enables the effective metallization of 2D semiconductors. The results indicate that expanding the vdW gap and stabilizing the interface structure through this post-treatment significantly improve the metal contact properties in devices such as field-effect transistors and photovoltaic Schottky diodes by minimizing metal-induced gap states, thus reducing Fermi level pinning. The application of Se intercalation and deintercalation techniques achieves an exceptionally low contact resistance of 773 Ω·μm between p-type WSe

Indexed as

2D−3D vdW interfaceintercalation/deintercalationpost-treatmentreconfigurationtwo-dimensional materialsvan der Waals metal contact

Identifiers

PMID39707996
PMCPMC11752511

What OpenQuestion holds

Textmetadata
LicenceCC BY-NC-ND
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.