Evidence map›Paper›PMID 39695208›Full record

ArticleNature2024

Growth-based monolithic 3D integration of single-crystal 2D semiconductors.

Ki Seok Kim, Seunghwan Seo, Junyoung Kwon, Doyoon Lee, Changhyun Kim, Jung-El Ryu, Jekyung Kim, Jun Min Suh, Hang-Gyo Jung, Youhwan Jo and 11 more

Abstract read
PubMed Publisher
In one paragraph

Article in Nature, 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 26 papers.

0numbers the graph read from it
0cells of the map it votes in
26citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

26 citing papers in PubMed.

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  15. Large-scale gate-all-around MoSNational science review · 2026
    Article
  16. Wafer-scale formation of MoSScientific reports · 2026
    Article
  17. Article
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

21 authors.

Ki Seok Kim *Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.ORCID http://orcid.org/0000-0002-7958-4058
Seunghwan Seo *Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.ORCID http://orcid.org/0000-0002-1703-2709
Junyoung Kwon *2D Device Laboratory, Samsung Advanced Institute of Technology, Suwon, Korea.ORCID http://orcid.org/0000-0002-5351-342X
Doyoon Lee *Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA.ORCID http://orcid.org/0000-0003-4355-8146
Changhyun Kim *2D Device Laboratory, Samsung Advanced Institute of Technology, Suwon, Korea.ORCID http://orcid.org/0000-0002-0989-1482
Jung-El RyuDepartment of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
Jekyung KimDepartment of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.ORCID http://orcid.org/0000-0002-8250-5736
Jun Min SuhDepartment of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.ORCID http://orcid.org/0000-0001-8506-0739
Hang-Gyo JungDepartment of Electrical and Computer Engineering Sungkyunkwan University, Suwon-si, South Korea.
Youhwan JoDepartment of Materials Science and Engineering, The University of Texas at Dallas, Richardson, TX, USA.
June-Chul ShinDepartment of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
Min-Kyu SongDepartment of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.ORCID http://orcid.org/0000-0002-9233-9356
Jin FengDepartment of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
Hogeun AhnDepartment of Electrical and Computer Engineering Sungkyunkwan University, Suwon-si, South Korea.ORCID http://orcid.org/0000-0003-2221-4862
Sangho LeeDepartment of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.ORCID http://orcid.org/0000-0003-4164-1827
Kyeongjae ChoDepartment of Materials Science and Engineering, The University of Texas at Dallas, Richardson, TX, USA.ORCID http://orcid.org/0000-0003-2698-7774
Jongwook JeonDepartment of Electrical and Computer Engineering Sungkyunkwan University, Suwon-si, South Korea.ORCID http://orcid.org/0000-0003-1159-584X
Minsu Seol2D Device Laboratory, Samsung Advanced Institute of Technology, Suwon, Korea. minsu.seol@samsung.com.ORCID http://orcid.org/0000-0002-8920-6181
Jin-Hong ParkDepartment of Electrical and Computer Engineering Sungkyunkwan University, Suwon-si, South Korea. jhpark9@skku.edu.ORCID http://orcid.org/0000-0001-8401-6920
Sang Won Kim2D Device Laboratory, Samsung Advanced Institute of Technology, Suwon, Korea. swon80.kim@samsung.com.ORCID http://orcid.org/0000-0001-7026-8721
Jeehwan KimDepartment of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA. jeehwan@mit.edu.ORCID http://orcid.org/0000-0002-1547-0967

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

The demand for the three-dimensional (3D) integration of electronic components is steadily increasing. Despite substantial processing challenges, the through-silicon-via (TSV) technique emerges as the only viable method for integrating single-crystalline device components in a 3D format

Identifiers

What OpenQuestion holds

Textmetadata
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.