Removal of Nanoparticles by Surface Nanobubbles Generated via Solvent-Water Exchange: A Critical Perspective.

The swift progression of technology in electronic fabrication is adhering to a trend of miniaturization, descending to the nanoscale. Surface contaminants, such as nanoparticles, can influence the performance of silicon wafers, thereby necessitating the evolution of novel cleaning methodologies. Surface nanobubbles (SNs) are phenomena that have attracted considerable attention over the past decade. A salient feature of SNs is their capacity to eliminate nanoparticles from silicon wafers. In this Perspective, our objective is to scrutinize whether this capability can be unequivocally ascribed to SNs. Initially, we offer a succinct elucidation of the nature of SNs; subsequently, we evaluate the claims regarding the cleaning efficacy of SNs; finally, we present our interpretation of the operative forces and propose potential scenarios of the interaction between SNs and nanoparticles. Consequently, the aim of this Perspective is to emphasize the significance of comprehending the interaction between SNs and nanoparticles with the intent to delineate new research trajectories bearing both fundamental and industrial ramifications.