ArticleNanophotonics (Berlin, Germany)2024
Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces.
Article in Nanophotonics (Berlin, Germany), 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.
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Who cites it
2 citing papers in PubMed.
- Spectroscopic Ellipsometry of Plasmonic Gratings-Ideal Parameters for Sensing and Subpicometer Measurement Uncertainty.ACS omega · 2025Article
- A progressive wafer scale approach for Sub-10 nm nanogap structures.Scientific reports · 2025Article
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Authors and funding
10 authors.
Funding
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Abstract
In the rapidly evolving field of plasmonic metasurfaces, achieving homogeneous, reliable, and reproducible fabrication of sub-5 nm dielectric nanogaps is a significant challenge. This article presents an advanced fabrication technology that addresses this issue, capable of realizing uniform and reliable vertical nanogap metasurfaces on a whole wafer of 100 mm diameter. By leveraging fast patterning techniques, such as variable-shaped and character projection electron beam lithography (EBL), along with atomic layer deposition (ALD) for defining a few nanometer gaps with sub-nanometer precision, we have developed a flexible nanofabrication technology to achieve gaps as narrow as 2 nm in plasmonic nanoantennas. The quality of our structures is experimentally demonstrated by the observation of resonant localized and collective modes corresponding to the lattice, with Q-factors reaching up to 165. Our technological process opens up new and exciting opportunities to fabricate macroscopic devices harnessing the strong enhancement of light-matter interaction at the single nanometer scale.
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