ArticleNanophotonics (Berlin, Germany)2023
Defining the zerogap: cracking along the photolithographically defined Au-Cu-Au lines with sub-nanometer precision.
Article in Nanophotonics (Berlin, Germany), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.
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Who cites it
5 citing papers in PubMed.
- Beyond limits: a tribute to Dai-Sik Kim's academic legacy and vision.Nanophotonics (Berlin, Germany) · 2025Article
- A progressive wafer scale approach for Sub-10 nm nanogap structures.Scientific reports · 2025Article
- Trench Formation under the Tunable Nanogap: Its Depth Depends on Maximum Strain and Periodicity.Micromachines · 2023Article
- Strain versus Tunable Terahertz Nanogap Width: A Simple Formula and a Trench below.Nanomaterials (Basel, Switzerland) · 2023Article
- Nanofabrication: the unsung hero in enabling advances in nanophotonics.Nanophotonics (Berlin, Germany) · 2023Article
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Authors and funding
9 authors.
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No grant is acknowledged in the PubMed record.
Abstract
Cracks are formed along the photolithographically pre-determined lines with extremely high yield and repeatability, when Cu clusters are introduced between planarized Au thin films sequentially deposited on a PET substrate. These clusters act as nanometer-sized spacers preventing the formation of contiguous metallic bond between the adjacent Au layers which will render prepatterned-cracking impossible. While the effective gap width is initially zero in the optical sense from microwaves all the way to the visible, outer-bending the PET substrate allows the gap width tuning into the 100 nm range, with the stability and controllability in the ranges of 100 s and Angstrom-scale, respectively. It is anticipated that our wafer-scale prepatterned crack technology with an unprecedented mixture of macroscopic length and Angstrom-scale controllability will open-up many applications in optoelectronics, quantum photonics and photocatalysis.
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