ArticleNanophotonics (Berlin, Germany)2023
Redeposition-free inductively-coupled plasma etching of lithium niobate for integrated photonics.
Article in Nanophotonics (Berlin, Germany), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 13 papers.
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Who cites it
13 citing papers in PubMed.
- Optical Fourier Surfaces for Integrated Photonics.ACS nano · 2026Article
- Surface and Interface Engineering in Integrated Photonic Sensors: Performance Trade-Offs, Stability, and Benchmarking.Micromachines · 2026Review
- Thin film lithium niobate on sapphire for integrated mid-infrared modulator.Nature communications · 2026Article
- Integrated lithium niobate photonic devices for photonic quantum information science.Nano convergence · 2025Review
- Nanodomain poling unlocking backward nonlinear light generation in thin film lithium niobate.Nanophotonics (Berlin, Germany) · 2025Article
- Engineering cm-scale true push-pull electro-optic modulators in a suspended GaAs photonic integrated circuit platform by exploiting the orientation induced asymmetry of the PockelsNanophotonics (Berlin, Germany) · 2025Article
- Efficient GHz electro-optical modulation with a nonlocal lithium niobate metasurface in the linear and nonlinear regime.Nature communications · 2025Article
- Scalable Lithium Niobate Nanoimprinting for Nonlinear Metalenses.Advanced materials (Deerfield Beach, Fla.) · 2025Article
- Towards High-Performance Pockels Effect-Based Modulators: Review and Projections.Micromachines · 2024Review
- Monolithic thin-film lithium niobate broadband spectrometer with one nanometre resolution.Nature communications · 2024Article
- Time-bin entangled Bell state generation and tomography on thin-film lithium niobate.NPJ quantum information · 2024Article
- Optimization of waveguide fabrication processes in lithium-niobate-on-insulator platform.AIP advances · 2024Article
- Nanofabrication: the unsung hero in enabling advances in nanophotonics.Nanophotonics (Berlin, Germany) · 2023Article
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Authors and funding
4 authors.
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Abstract
Lithium niobate on insulator is being established as a versatile platform for a new generation of photonic integrated devices. Extensive progress has been made in recent years to improve the fabrication of integrated optical circuits from a research platform towards wafer-scale fabrication in commercial foundries, and optical losses have reached remarkably low values approaching material limits. In this context, argon etching of lithium niobate waveguides has been shown to provide the best optical quality, yet the process is still challenging to optimise due to its physical nature. Namely, the micro-masking effects introduced by the material redeposition and a close to one etch mask selectivity for deep etches. We present a workflow to identify the parameter set offering the best etching results independent of the plasma system being used. We show how to reach the redeposition-free regime and propose three methods to achieve redeposition-free lithium niobate etching with good quality sidewalls without need of wet chemistry for cleaning.
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