ArticleNanophotonics (Berlin, Germany)2023
Guided domino lithography for uniform fabrication of single-digit-nanometer scale plasmonic nanoantenna.
Article in Nanophotonics (Berlin, Germany), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
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Who cites it
3 citing papers in PubMed.
- Metalens for passive generation of a droplet Bessel beam.Microsystems & nanoengineering · 2025Article
- Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces.Nanophotonics (Berlin, Germany) · 2024Article
- Nanofabrication: the unsung hero in enabling advances in nanophotonics.Nanophotonics (Berlin, Germany) · 2023Article
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5 authors.
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Abstract
Single-digit-nanometer scale plasmonic nanoantenna platforms are widely used in optical sensors, quantum plasmonics, and other applications. Uniform and reliable fabrications with a single-digit-nanometer resolution are desirable for diverse quantum nanophotonic device applications, but improving the process yield and uniformity of the shape of the nanoantenna over the entire fabrication area remains a challenge. Here we report the guided domino lithography fabrication method for uniform ultra-sharp nanoantenna arrays. We use a collapsing of unstable photoresist nanostructures with a guide structure to uniformly fabricate ultra-sharp bowtie photoresist masks. We directly compare the yields of the conventional and the guided domino lithography under the optimized electron beam exposing and development conditions. Furthermore, we conduct a rigorous analysis to verify the electric field enhancement effect from ultra-sharp bowtie nanoantennas fabricated with different geometry. We believe that guided domino lithography can be a promising solution toward a practical manufacturing method for single-digit-nanometer plasmonic nanoantennas.
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