Evidence map›Paper›PMID 39633747›Full record

ArticleNanophotonics (Berlin, Germany)2023

Inverse design of high-NA metalens for maskless lithography.

Haejun Chung, Feng Zhang, Hao Li, Owen D Miller, Henry I Smith

Abstract read
In one paragraph

Article in Nanophotonics (Berlin, Germany), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 10 papers.

0numbers the graph read from it
0cells of the map it votes in
10citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

10 citing papers in PubMed.

  1. Article
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  3. Review
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  5. Review
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

5 authors.

Haejun ChungDepartment of Electronic Engineering, Hanyang University, Seoul, 04763, South Korea.ORCID https://orcid.org/0000-0001-8959-237X
Feng ZhangLumArray, Inc., 15 Ward Street, Somerville, MA 02143, USA.
Hao LiDepartment of Applied Physics and Energy Sciences Institute, Yale University, New Haven, CT 06511, USA.
Owen D MillerDepartment of Applied Physics and Energy Sciences Institute, Yale University, New Haven, CT 06511, USA.
Henry I SmithLumArray, Inc., 15 Ward Street, Somerville, MA 02143, USA.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry. First, we derive a computational upper bound for a unit-cell-based axisymmetric metalens. Then, we demonstrate a fabrication-compatible inverse-designed metalens with 85.50% transmission normalized focusing efficiency at 0.6 numerical aperture at 405 nm wavelength; a higher efficiency than a theoretical gradient index lens design (79.98%). We also demonstrate experimental validation for our axisymmetric inverse-designed metalens via electron beam lithography. Metalens-based maskless lithography may open a new way of achieving low-cost, large-area nanofabrication.

Indexed as

inverse designmaskless lithographymetalens

Identifiers

PMID39633747
PMCPMC11501502

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.