ArticleSensors (Basel, Switzerland)2024
A Fabrication Method for Realizing Vertically Aligned Silicon Nanowires Featuring Precise Dimension Control.
Article in Sensors (Basel, Switzerland), 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
2 citing papers in PubMed.
- Sidewall Patterning in 3D Micro/Nanosystems: A Review.Micromachines · 2026Review
- Fabrication and dimensional scaling of SiNW-FET array via AFM-LAO lithography and self-limiting oxidation.Scientific reports · 2025Article
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
4 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Silicon nanowires (SiNWs) have garnered considerable attention in the last few decades owing to their versatile applications. One extremely desirable aspect of fabricating SiNWs is controlling their dimensions and alignment. In addition, strict control of surface roughness or diameter modulation is another key parameter for enhanced performance in applications such as photovoltaics, thermoelectric devices, etc. This study investigates a method of fabricating silicon nanowires using electron beam lithography (EBL) and the deep reactive ion etching (DRIE) Bosch process to achieve precisely controlled fabrication. The fabricated nanowires had a pitch error within 2% of the pitch of the direct writing mask. The maximum error in the average diameter was close to 25%. The simplified two-step method with tight control of the dimensions and surface tunability presents a reliable technique to fabricate vertically aligned SiNWs for some targeted applications.
Indexed as
Identifiers
What OpenQuestion holds
Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.