ArticleACS omega2024
Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography.
Xue Cong et al.PubMed ↗Full text ↗Publisher ↗
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ArticleACS omega2024
Xue Cong et al.PubMed ↗Full text ↗Publisher ↗
No numbers read from the abstract.