ArticleACS materials Au2024
Multinuclear Tin-Based Macrocyclic Organometallic Resist for EUV Photolithography.
Article in ACS materials Au, 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 7 papers.
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
7 citing papers in PubMed.
- Recent efforts of vapour-phase strategies for EUV resist toward high- and hyper-NA extreme ultraviolet lithography.Chemical science · 2026Review
- Polarity-engineered Sn-Ti cluster photoresists for sub-10-nm high-resolution lithography.Smart molecules : open access · 2026Article
- Mechanism of Vapor-Phase Infiltration of Organometallic Hf in Poly(Methyl Methacrylate) for Hybrid Resist Applications.Chemistry of materials : a publication of the American Chemical Society · 2026Article
- Polytelluoxane as the ideal formulation for EUV photoresist.Science advances · 2025Article
- Nanoscale Resist-Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2025Article
- Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da).ACS nano · 2024Article
- Electron-Beam-Induced Modification of N-Heterocyclic Carbenes: Carbon Nanomembrane Formation.The journal of physical chemistry letters · 2024Article
Corrections and comments
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Authors and funding
5 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
We report a new photoresist based on a multinuclear tin-based macrocyclic complex and its performance for extreme UV (EUV) photolithography. The new photoresist has a trinuclear macrocyclic structure containing three salicylhydroxamic acid ligands and six Sn-CH
Identifiers
What OpenQuestion holds
Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.