ReviewMaterials (Basel, Switzerland)2024
Recent Advances in Positive Photoresists: Mechanisms and Fabrication.
Review in Materials (Basel, Switzerland), 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
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Who cites it
6 citing papers in PubMed.
- Recent advances in polymeric chemically amplified positive resists: Materials and design strategies.Smart molecules : open access · 2026Review
- Atomistic insights into EUV photoresist photolysis via full temporal dynamics.Communications chemistry · 2026Article
- Molecular nonchemically amplified resists based on spirobixanthene backbone: Sulfoxime oxime esters versus sulfonium salts.Smart molecules : open access · 2026Article
- Integrated Strategies for Overcoming Resolution Limits in Electron Beam Lithography of Chemically Amplified Resists.ACS applied materials & interfaces · 2026Article
- Advancements in Lithography Techniques and Emerging Molecular Strategies for Nanostructure Fabrication.International journal of molecular sciences · 2025Review
- Directional Fluidity of Dense Emulsion Activated by Transverse Wedge-Shaped Microroughness.Micromachines · 2025Article
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
5 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Photoresists are fundamental materials in photolithography and are crucial for precise patterning in microelectronic devices, MEMS, and nanostructures. This paper provides an in-depth review of recent advancements in positive photoresist research and development, focusing on discussion regarding the underlying mechanisms governing their behavior, exploring innovative fabrication techniques, and highlighting the advantages of the photoresist classes discussed. The paper begins by discussing the need for the development of new photoresist technologies, highlighting issues associated with adopting extreme ultraviolet photolithography and addressing these challenges through the development of advanced positive-tone resist materials with improved patterning features, resolution, and sensitivity. Subsequently, it discusses the working mechanisms and synthesis methods of different types and subtypes of photoresists, starting from non-chemically amplified, organic, and inorganic-organic hybrid photoresists and progressing to dry film resists, with an emphasis on the upsides of each. The paper concludes by discussing how future research in the field of lithography-prioritizing concerns related to environmental impacts, improved photoresist material and properties, and utilization of advanced quantum technology-can assist with revolutionizing lithography techniques.
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What OpenQuestion holds
Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.