Zinc Oxide Nanostructure Deposition into Sub-5 nm Vertical Mesopores in Silica Hard Templates by Atomic Layer Deposition.

Tauqir Nasir, Yisong Han, Chris Blackman, Richard Beanland, Andrew L Hector

Abstract read

In one paragraph

Article in Materials (Basel, Switzerland), 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

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1citing papers in PubMed

–field-weighted citation impact

1 · What the graph read from it

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Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

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2 · The registry

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3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

Nanostructured Thin Films: Properties, Fabrication and Applications-A Short Review.Nanomaterials (Basel, Switzerland) · 2025
Review

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5 · Who and what money

Authors and funding

5 authors.

Tauqir NasirSchool of Chemistry, University of Southampton, Highfield, Southampton SO17 1BJ, UK.

Yisong HanDepartment of Physics, University of Warwick, Coventry CV4 7AL, UK.

Chris BlackmanDepartment of Chemistry, University College London, London WC1E 6BT, UK.ORCID 0000-0003-0700-5843

Richard BeanlandDepartment of Physics, University of Warwick, Coventry CV4 7AL, UK.

Andrew L HectorSchool of Chemistry, University of Southampton, Highfield, Southampton SO17 1BJ, UK.ORCID 0000-0002-9964-2163

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Nanostructures synthesised by hard-templating assisted methods are advantageous as they retain the size and morphology of the host templates which are vital characteristics for their intended applications. A number of techniques have been employed to deposit materials inside porous templates, such as electrodeposition, vapour deposition, lithography, melt and solution filling, but most of these efforts have been applied with pore sizes higher in the mesoporous regime or even larger. Here, we explore atomic layer deposition (ALD) as a method for nanostructure deposition into mesoporous hard templates consisting of mesoporous silica films with sub-5 nm pore diameters. The zinc oxide deposited into the films was characterised by small-angle X-ray scattering, X-ray diffraction and energy-dispersive X-ray analysis.

Indexed as

atomic layer depositionelectrochemically assisted surfactant assemblymesoporous silicasmall poreszinc oxide

Identifiers

PMID38793341

DOI10.3390/ma17102272

PMCPMC11123318

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