Evidence map›Paper›PMID 38764660›Full record

ReviewACS omega2024

Electroplated Copper Additives for Advanced Packaging: A Review.

Lanfeng Guo, Shaoping Li, Zhaobo He, Yanmei Fu, Facheng Qiu, Renlong Liu, Guangzhou Yang

Abstract readReview
In one paragraph

Review in ACS omega, 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 7 papers.

0numbers the graph read from it
0cells of the map it votes in
7citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

7 citing papers in PubMed.

  1. Porous Ultralow-κ spAdvanced science (Weinheim, Baden-Wurttemberg, Germany) · 2026
    Article
  2. Novel Triazine Derivatives Efficiently Regulate the Interfacial Behavior of Metallic Zinc in Sulfuric Acid Electrolyte.Chemphyschem : a European journal of chemical physics and physical chemistry · 2026
    Article
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4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

7 authors.

Lanfeng GuoSchool of Chemistry and Chemical Engineering, Chongqing University, Chongqing 400044, China.
Shaoping LiHubei Three Gorges Laboratory, Hubei 443007, China.
Zhaobo HeHubei Sinophorus Electronic Materials Co., Ltd., Hubei 443007, China.
Yanmei FuHubei Sinophorus Electronic Materials Co., Ltd., Hubei 443007, China.
Facheng QiuCollege of Chemistry and Chemical Engineering, Chongqing University of Technology, Chongqing 400054, China.ORCID https://orcid.org/0000-0002-9998-9175
Renlong LiuSchool of Chemistry and Chemical Engineering, Chongqing University, Chongqing 400044, China.ORCID https://orcid.org/0009-0004-9591-9331
Guangzhou YangCollege of Chemistry and Chemical Engineering, Chongqing University of Technology, Chongqing 400054, China.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Acid copper electroplating stands as a core technology in advanced packaging processes, facilitating the realization of metal interconnects, bumps, vias, and substrate wiring between transistors. The deposition quality of copper interconnect materials has a crucial impact on the final performance of chips, directly influencing their yield, reliability, and stability. In this intricate process, additives play a pivotal role in regulating the deposition quality and behavior of metal copper. This mini-review comprehensively summarizes the recent research progress in the field of electroplating copper additives for advanced packaging, both domestically and internationally, delving into the types and mechanisms of various additive molecules, including accelerators, inhibitors, and leveling agents. Through in-depth research on these additives, we gain a profound understanding of their specific roles in the electroplating process and the intricate interaction mechanisms among them, providing theoretical support for optimizing the electroplating process. Furthermore, this mini-review also delves into a thorough analysis of the current issues and challenges facing acid copper electroplating, exploring the key factors that constrain the further development of electroplating copper technology. Based on this analysis, we propose several potential solutions and research directions, offering crucial references for the development and application of electroplating copper additives in advanced packaging. In conclusion, this mini-review aims to provide a comprehensive perspective and profound understanding of the development and application of electroplating copper additives through a review and analysis of recent research progress, ultimately aiming to promote the further advancement of advanced packaging technology.

Identifiers

PMID38764660
PMCPMC11097365

What OpenQuestion holds

Textmetadata
LicenceCC BY-NC-ND
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.