ArticleACS omega2024
Stimulated Emission Depletion Inspired Sub-100 nm Structuring of Epoxides Using 2-Chlorothioxanthone as Photosensitizer.
Article in ACS omega, 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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2 authors.
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Abstract
Until very recently, the enhancement of multiphoton-based optical lithography by stimulated emission depletion (STED) inspired techniques was limited mostly to (meth)acrylates. Epoxides, which play an important role in semiconductor clean-room technology, were basically excluded from capitalizing on STED-inspired lithography, and if they were successfully used in STED-inspired lithography, the achievable structure sizes remained at 125 nm and above. We now found that using 2-chlorothioxanthone (CTX) as a sensitizer for a sulfonium salt acting as the photoinitiator allows for shrinking the structure size down to 83 nm. Compared to the previously used sensitizer 2-isopropylthioxanthone, the triplet lifetime of CTX within the epoxide monomers is supposed to be prolonged by 40%, which renders an optical depletion via excited triplet state absorption more efficient, leading to a sub-100 nm structuring capability.
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