Evidence map›Paper›PMID 38493192›Full record

ArticleNature communications2024

Light and matter co-confined multi-photon lithography.

Lingling Guan, Chun Cao, Xi Liu, Qiulan Liu, Yiwei Qiu, Xiaobing Wang, Zhenyao Yang, Huiying Lai, Qiuyuan Sun, Chenliang Ding and 3 more

Erratum issuedAbstract read
In one paragraph

Article in Nature communications, 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. An erratum has been issued. Cited by 12 papers.

0numbers the graph read from it
0cells of the map it votes in
12citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

12 citing papers in PubMed.

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4 · The record

Corrections and comments

5 · Who and what money

Authors and funding

13 authors.

Lingling Guan *Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Chun Cao *State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027, Hangzhou, China. caochun@iccas.ac.cn.ORCID http://orcid.org/0000-0002-7332-073X
Xi Liu *Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Qiulan LiuResearch Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Yiwei QiuResearch Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Xiaobing WangResearch Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Zhenyao YangResearch Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Huiying LaiResearch Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Qiuyuan SunResearch Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Chenliang DingResearch Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Dazhao ZhuResearch Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Cuifang KuangState Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027, Hangzhou, China. cfkuang@zju.edu.cn.ORCID http://orcid.org/0000-0002-7650-0349
Xu LiuState Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027, Hangzhou, China. liuxu@zju.edu.cn.ORCID http://orcid.org/0000-0003-3982-3197

Funding

National Natural Science Foundation of China (National Science Foundation of China) 22105180National Natural Science Foundation of China (National Science Foundation of China) 62125504
6 · The paper itself

Abstract

Mask-free multi-photon lithography enables the fabrication of arbitrary nanostructures low cost and more accessible than conventional lithography. A major challenge for multi-photon lithography is to achieve ultra-high precision and desirable lateral resolution due to the inevitable optical diffraction barrier and proximity effect. Here, we show a strategy, light and matter co-confined multi-photon lithography, to overcome the issues via combining photo-inhibition and chemical quenchers. We deeply explore the quenching mechanism and photoinhibition mechanism for light and matter co-confined multiphoton lithography. Besides, mathematical modeling helps us better understand that the synergy of quencher and photo-inhibition can gain a narrowest distribution of free radicals. By using light and matter co-confined multiphoton lithography, we gain a 30 nm critical dimension and 100 nm lateral resolution, which further decrease the gap with conventional lithography.

Identifiers

PMID38493192
PMCPMC10944545

What OpenQuestion holds

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LicenceCC BY
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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.