ArticleScientific reports2024
Optimization of the plasmonic properties of titanium nitride films sputtered at room temperature through microstructure and thickness control.
Article in Scientific reports, 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
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Who cites it
3 citing papers in PubMed.
- TiN Plasmonic Metamaterial Arrays Fabricated at Low Temperatures on Versatile Substrates.ACS applied optical materials · 2025Article
- Thermally Robust Plasmonic Nanorings from Titanium Nitride.ACS omega · 2025Article
- Oxidation Performance of Nano-Layered (AlTiZrHfTa)NMaterials (Basel, Switzerland) · 2024Article
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Authors and funding
6 authors.
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Abstract
A current approach to depositing highly plasmonic titanium nitride films using the magnetron sputtering technique assumes that the process is performed at temperatures high enough to ensure the atoms have sufficient diffusivities to form dense and highly crystalline films. In this work, we demonstrate that the plasmonic properties of TiN films can be efficiently tuned even without intentional substrate heating by influencing the details of the deposition process and entailed films' stoichiometry and microstructure. We also discuss the dependence of the deposition time/films' thickness on the optical properties, which is another degree of freedom in controlling the optical response of the refractory metal nitride films. The proposed strategy allows for robust and cost-effective production of large-scale substrates with good plasmonic properties in a CMOS technology-compatible process that can be further processed, e.g., structurized. All reported films are characterized by the maximal values of the plasmonic Figure of Merit (FoM = - ε
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