ArticleMicrosystems & nanoengineering2024
Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification.
Article in Microsystems & nanoengineering, 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 10 papers.
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Who cites it
10 citing papers in PubMed.
- Printing Beyond Fabrication: A Physicochemical Vision for Emerging Device Technologies.ACS physical chemistry Au · 2026Review
- Optical Fourier Surfaces for Integrated Photonics.ACS nano · 2026Article
- Engineered Strain in 2D Materials by Direct Growth on Deterministically Patterned Grayscale Topographies.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2026Article
- Quantitative mapping of smooth topographic landscapes generated using thermal scanning-probe lithography.Nature protocols · 2026Review
- Beyond binary patterning: polypropylene carbonate as a versatile thermal resist for high-fidelity grayscale Nanofabrication.Microsystems & nanoengineering · 2026Article
- Gradient Electronic Landscapes in van der Waals Heterostructures.Nano letters · 2025Article
- Compound meta-optics: there is plenty of room at the top.Nanophotonics (Berlin, Germany) · 2025Article
- Interference Field Control for High-Uniformity Nanopatterning: A Review.Sensors (Basel, Switzerland) · 2025Review
- Deterministic grayscale nanotopography to engineer mobilities in strained MoSNature communications · 2024Article
- Optimization of Grayscale Lithography for the Fabrication of Flat Diffractive Infrared Lenses on Silicon Wafers.Micromachines · 2024Article
Corrections and comments
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Authors and funding
12 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Grayscale structured surfaces with nanometer-scale features are used in a growing number of applications in optics and fluidics. Thermal scanning probe lithography achieves a lateral resolution below 10 nm and a vertical resolution below 1 nm, but its maximum depth in polymers is limited. Here, we present an innovative combination of nanowriting in thermal resist and plasma dry etching with substrate cooling, which achieves up to 10-fold amplification of polymer nanopatterns into SiO
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Registered trials
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