ArticleAdvanced science (Weinheim, Baden-Wurttemberg, Germany)2024
Multi- and Gray-Scale Thermal Lithography of Silk Fibroin as Water-Developable Resist for Micro and Nanofabrication.
Article in Advanced science (Weinheim, Baden-Wurttemberg, Germany), 2024. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 4 papers.
What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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Who cites it
4 citing papers in PubMed.
- Targeting the circadian negative regulatorMaterials today. Bio · 2026Article
- Printing Beyond Fabrication: A Physicochemical Vision for Emerging Device Technologies.ACS physical chemistry Au · 2026Review
- Beyond binary patterning: polypropylene carbonate as a versatile thermal resist for high-fidelity grayscale Nanofabrication.Microsystems & nanoengineering · 2026Article
- Multi- and Gray-Scale Thermal Lithography of Silk Fibroin as Water-Developable Resist for Micro and Nanofabrication.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2024Article
Corrections and comments
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Authors and funding
7 authors.
Funding
Abstract
Silk fibroin (SF) is a natural material with polymorphic structures that determine its water solubility and biodegradability, which can be altered by exposing it to heat. Here, a hybrid thermal lithography method combining scalable microscale laser-based patterning with nanoscale patterning based on thermal scanning probe lithography is developed. The latter enables in addition grayscale patterns to be made. The resolution limit of the writing in silk fibroin is studied by using a nanoscale heat source from a scanned nanoprobe. The heat thereby induces local water solubility change in the film, which can subsequently be developed in deionized water. Nanopatterns and grayscale patterns down to 50 nm lateral resolution are successfully written in the silk fibroin that behaves like a positive tone resist. The resulting patterned silk fibroin is then applied as a mask for dry etching of SiO
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Registered trials
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