Evidence map›Paper›PMID 38138794›Full record

ReviewMaterials (Basel, Switzerland)2023

Advanced 3D Through-Si-Via and Solder Bumping Technology: A Review.

Ye Jin Jang, Ashutosh Sharma, Jae Pil Jung

Abstract readReview
In one paragraph

Review in Materials (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.

0numbers the graph read from it
0cells of the map it votes in
5citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

5 citing papers in PubMed.

  1. Review
  2. Review
  3. Article
  4. Article
  5. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

3 authors.

Ye Jin JangDepartment of Materials Science and Engineering, University of Seoul, Seoul 02504, Republic of Korea.
Ashutosh SharmaDepartment of Materials Science and Engineering, Ajou University, 206-Worldcup-ro, Yeongtong-gu, Gyeonggi-do, Suwon 16499, Republic of Korea.ORCID 0000-0003-0413-4623
Jae Pil JungDepartment of Materials Science and Engineering, University of Seoul, Seoul 02504, Republic of Korea.

Funding

This paper was supported by Korea Institute for Advancement of Technology(KIAT) grant funded by the Korea Government(MOTIE) (P0018010, 2023) P0018010, 2023
6 · The paper itself

Abstract

Three-dimensional (3D) packaging using through-Si-via (TSV) is a key technique for achieving high-density integration, high-speed connectivity, and for downsizing of electronic devices. This paper describes recent developments in TSV fabrication and bonding methods in advanced 3D electronic packaging. In particular, the authors have overviewed the recent progress in the fabrication of TSV, various etching and functional layers, and conductive filling of TSVs, as well as bonding materials such as low-temperature nano-modified solders, transient liquid phase (TLP) bonding, Cu pillars, composite hybrids, and bump-free bonding, as well as the role of emerging high entropy alloy (HEA) solders in 3D microelectronic packaging. This paper serves as a guideline enumerating the current developments in 3D packaging that allow Si semiconductors to deliver improved performance and power efficiency.

Indexed as

Cu pillar bondinghigh entropy alloyshybrid composite bondingthree-dimensional packagingthrough-Si-via

Identifiers

PMID38138794
PMCPMC10744783

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.